As extreme ultraviolet (EUV) lithography moves closer to production, the industry is paying more attention to a problematic phenomenon called mask 3D effects. Mask 3D effects involve the photomask for ...

Abstract: Mask 3D effect has been studied in the past and the main characteristic of it is that it will cause positive focus shift to the semi-dense patterns at pitches of 200 and 300 nm for as much ...